Off-axis illumination of lithography tool

Han Xing; Li Lin; Ma Bin

doi:10.1117/12.2034891

31 December 2013 Off-axis illumination of lithography tool

Han Xing, Li Lin, Ma Bin

Author Affiliations +

Proceedings Volume 9042, 2013 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments; 90420U (2013) https://doi.org/10.1117/12.2034891
Event: International Conference on Optical Instruments and Technology (OIT2013), 2013, Beijing, China

Abstract

Lithography tool is a necessary part for LSI and VLSI. The illumination system design is an important part in the lithography optical system design. Off-axis illumination technology is an effective way to reducing resolution of lithography. The paper introduction the basic components of lithography tool, the principle of off-axis illumination reducing the resolution of lithography and focus on the two implementations of OAI technology, finally point out advantages and disadvantage of the two implementations.

Citation Download Citation

Han Xing, Li Lin, and Ma Bin "Off-axis illumination of lithography tool", Proc. SPIE 9042, 2013 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 90420U (31 December 2013); https://doi.org/10.1117/12.2034891

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE