Paper
7 March 2014 Isolating the negative stiffness region of a buckled Si/SiO2 membrane
Kyle K. Ziegler, Robert A. Lake, Ronald A. Coutu Jr.
Author Affiliations +
Abstract
Negative stiffness can provide a method of altering the stiffness of a device without changing its geometry. The silicon/ silicon dioxide (Si/SiO2) membrane presented in this research utilizes buckling resulting from compressive residual stress. A transversely actuated buckled membrane displays properties similar to a linear regressive spring, which include a positive and negative stiffness region. Cantilever beams were used to restrict the outward displacement of the membrane and force it to actuate only in its negative stiffness region. Analytical equations were utilized to estimate the amount of outward deflection by the membrane and to estimate the amount of reduced deflection required for the device to display only negative stiffness characteristics. Devices were tested using a force sensor actuated by a piezo controller. Interferometric imaging confirmed the cantilevers ability to reduce the buckling displacement in the membrane up to 30%.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kyle K. Ziegler, Robert A. Lake, and Ronald A. Coutu Jr. "Isolating the negative stiffness region of a buckled Si/SiO2 membrane", Proc. SPIE 8973, Micromachining and Microfabrication Process Technology XIX, 897304 (7 March 2014); https://doi.org/10.1117/12.2037383
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KEYWORDS
Etching

Silicon

Microelectromechanical systems

Sensors

Neodymium

Deep reactive ion etching

Ions

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