The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

Kenneth A. Goldberg; Iacopo Mochi; Markus P. Benk; Chihcheng Lin; Arnaud P. Allezy; Michael Dickinson; Carl W. Cork; James B. Macdougall; Erik H. Anderson; Weilun Chao; Farhad Salmassi; Eric M. Gullikson; Daniel Zehm; Vamsi Vytla; William Cork; Jason DePonte; Gino Picchi; Ahmet Pekedis; Takeshi Katayanagi; Michael S Jones; Elizabeth Martin; Patrick P Naulleau; Senajith B Rekawa

doi:10.1117/12.2026496

20 September 2013 The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk, Chihcheng Lin, Arnaud P. Allezy, Michael Dickinson, Carl W. Cork, James B. Macdougall, Erik H. Anderson, Weilun Chao, Farhad Salmassi, Eric M. Gullikson, Daniel Zehm, Vamsi Vytla, William Cork, Jason DePonte, Gino Picchi, Ahmet Pekedis, Takeshi Katayanagi, Michael S Jones, Elizabeth Martin, Patrick P Naulleau, Senajith B Rekawa

Author Affiliations +

Proceedings Volume 8880, Photomask Technology 2013; 88800T (2013) https://doi.org/10.1117/12.2026496
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

The SEMATECH High Numerical Aperture Actinic Reticle Review Project (SHARP) is a newly commissioned, synchrotron-based extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP offers several major advances including objective lenses with 4xNA values from 0.25 to 0.625, flexible, lossless coherence control through a Fourier-synthesis illuminator, a rotating azimuthal plane of incidence up to ±25°, illumination central ray angles from 6 to 10°, and a continuously tunable, EUV illumination wavelength. SHARP is now being used to study programmed and native mask defects, defect repairs, mask architecture, optical proximity correction, and the influence of mask substrate roughness on imaging. SHARP has the ability to emulate a variety of current and future lithography tool numerical apertures, and illumination properties. Here, we present various performance studies and examples where SHARP’s unique capabilities are used in EUV mask research.

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Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk, Chihcheng Lin, Arnaud P. Allezy, Michael Dickinson, Carl W. Cork, James B. Macdougall, Erik H. Anderson, Weilun Chao, Farhad Salmassi, Eric M. Gullikson, Daniel Zehm, Vamsi Vytla, William Cork, Jason DePonte, Gino Picchi, Ahmet Pekedis, Takeshi Katayanagi, Michael S Jones, Elizabeth Martin, Patrick P Naulleau, and Senajith B Rekawa "The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope", Proc. SPIE 8880, Photomask Technology 2013, 88800T (20 September 2013); https://doi.org/10.1117/12.2026496

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