Characterisation of EUV damage thresholds and imaging performance of Mo/Si multilayer mirrors

Matthias Müller; Frank Barkusky; Torsten Feigl; Klaus Mann

doi:10.1117/12.2016980

3 May 2013 Characterisation of EUV damage thresholds and imaging performance of Mo/Si multilayer mirrors

Matthias Müller, Frank Barkusky, Torsten Feigl, Klaus Mann

Proceedings Volume 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III; 877705 (2013) https://doi.org/10.1117/12.2016980
Event: SPIE Optics + Optoelectronics, 2013, Prague, Czech Republic

Abstract

We studied 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirrors, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is ≈ 60 % lower than the single pulse threshold, implying a defect dominated damage process. Using Nomarski (DIC) and atomic force microscopy (AFM) we analysed the damage morphologies, indicating a primarily thermally induced damage mechanism. Furthermore, we studied the radiationinduced change of reflectivity upon damage of a multilayer mirror. Additionally, we characterised transmission and reflection properties of novel Mo/Si multilayer beam splitters performing wavefront measurements with a Hartmann sensor at 13.5 nm wavelength. Such wavefront measurements allow also actinic investigations of thermal lens effects on EUV optics.

Citation Download Citation

Matthias Müller, Frank Barkusky, Torsten Feigl, and Klaus Mann "Characterisation of EUV damage thresholds and imaging performance of Mo/Si multilayer mirrors", Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 877705 (3 May 2013); https://doi.org/10.1117/12.2016980

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