New negative resist design with novel photo-base generator

Wen-Yun Wang; Cheng Han Wu; Yu-Chang Su; Chen-Hao Wu; Ya-Hui Chang; Ching-Yu Chang; Yao-Ching Ku

doi:10.1117/12.2018113

29 March 2013 New negative resist design with novel photo-base generator

Wen-Yun Wang, Cheng Han Wu, Yu-Chang Su, Chen-Hao Wu, Ya-Hui Chang, Ching-Yu Chang, Yao-Ching Ku

Proceedings Volume 8682, Advances in Resist Materials and Processing Technology XXX; 86821Y (2013) https://doi.org/10.1117/12.2018113
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

An alternate negative tone resist is investigated for advanced lithography. Unlike conventional negative tone development (NTD) resists developed with organic solvent, this negative resist use TMAH as its developer. Thermal acid generator (TAG) and photo base generator (PBG) are proposed for this resist. PBG decomposes and generates alkali at the exposed area and neutralizes the acid from TAG. Hence, positive resist can produce negative tone image (NTI), and gain better optical contrast than positive tone imaging. The new negative resist reported in this paper also shows better resolution than conventional negative resist. Several optimization studies are also reported. In addition, major limitations on further improving resist resolution are also pointed out in this paper. The solution proposed has been proven workable from experimental results. This opens the possibility to combine better optical contrast from NTI, high resist resolution from positive resist resin, and better development contrast from TMAH solution.

Citation Download Citation

Wen-Yun Wang, Cheng Han Wu, Yu-Chang Su, Chen-Hao Wu, Ya-Hui Chang, Ching-Yu Chang, and Yao-Ching Ku "New negative resist design with novel photo-base generator", Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86821Y (29 March 2013); https://doi.org/10.1117/12.2018113

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