Diffusion of acid from resist to Si-hardmask layer

Masamitsu Shirai; Hiroki Takeda; Tatsuya Hatsuse; Haruyuki Okamura; Hiroyuki Wakayama; Makoto Nakajima

doi:10.1117/12.915935

19 March 2012 Diffusion of acid from resist to Si-hardmask layer

Masamitsu Shirai, Hiroki Takeda, Tatsuya Hatsuse, Haruyuki Okamura, Hiroyuki Wakayama, Makoto Nakajima

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83251L (2012) https://doi.org/10.1117/12.915935
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

In a chemically amplified (CA) resist process, photochemically generated acid can diffuse in the resist matrix, inducing the de-protection reactions. The concentration of acid in resist matrix should be constant during the post-exposure-bake (PEB) treatment. In the practical resist processes, bottom anti-reflective coating (BARC) is essentially important to provide reflectivity control for resist patterning. In some cases, however, the photochemically generated acid in resist layer can diffuse into BARC layer, which causes the footing for resist patterns. In this work, we have studied the diffusion of acid from CA resist layer to Si-hardmask (Si-HM) layer. The Si-HM is essential for the multi-layer patterning process. The acid concentration in the resist layer was estimated based on the de-protection reaction kinetics for the CA resist using rapid scan FT-IR spectroscopy. It was found that the acid in resist layer diffused into the Si-HM layer. The diffusion efficiency of the acid was dependent on the crosslinking density of the Si-HM and the chemical structure of the resist.

Citation Download Citation

Masamitsu Shirai, Hiroki Takeda, Tatsuya Hatsuse, Haruyuki Okamura, Hiroyuki Wakayama, and Makoto Nakajima "Diffusion of acid from resist to Si-hardmask layer", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251L (19 March 2012); https://doi.org/10.1117/12.915935

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available