Development of debris-mitigation tool for HVM DPP source

Hironobu Yabuta; Shinsuke Mori; Takahiro Inoue; Yusuke Teramoto; Hiroto Sato; Kazuaki Hotta

doi:10.1117/12.879471

8 April 2011 Development of debris-mitigation tool for HVM DPP source

Hironobu Yabuta, Shinsuke Mori, Takahiro Inoue, Yusuke Teramoto, Hiroto Sato, Kazuaki Hotta

Author Affiliations +

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79692U (2011) https://doi.org/10.1117/12.879471
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Debris-mitigation tools (DMTs) have been used in DPP sources and the performance has been well proven in alpha sources. In beta and HVM sources, requirement to the DMT is increasing to fulfill the power and lifetime requirements simultaneously. In order to bring DPP technology into HVM level, a high-performance DMT has been developed. It has high mitigation performance for both neutral and ionic debris, large collection angle of the collector having high optical transmission, and withstand large thermal input from the discharge source head. Experiments were carried out using mirror samples and proved sufficient performance with which no sputtering and deposition were observed.

Citation Download Citation

Hironobu Yabuta, Shinsuke Mori, Takahiro Inoue, Yusuke Teramoto, Hiroto Sato, and Kazuaki Hotta "Development of debris-mitigation tool for HVM DPP source", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692U (8 April 2011); https://doi.org/10.1117/12.879471

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