Multiphoton lithography and ITO structuring by high repetition-rate sub-15 femtosecond laser pulses

Maziar Afshar; Somaie Saremi; Henning Völlm; Dara Feili; Helmut Seidel; Martin Straub; H. Zhang; Karsten König

doi:10.1117/12.875897

25 February 2011 Multiphoton lithography and ITO structuring by high repetition-rate sub-15 femtosecond laser pulses

Maziar Afshar, Somaie Saremi, Henning Völlm, Dara Feili, Helmut Seidel, Martin Straub, H. Zhang, Karsten König

Author Affiliations +

Proceedings Volume 7920, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVI; 792015 (2011) https://doi.org/10.1117/12.875897
Event: SPIE LASE, 2011, San Francisco, California, United States

Abstract

We report on experiments using a near-infrared Ti:Sapphire laser system based on a 85 MHz, sub-15 fs resonator. In the negative photoresist SU-8 multiphoton polymerization of 3D structures resulted in a minimum line width of approximately 80 nm at aspect ratios in excess of 50:1. The second part of our contribution deals with sub-wavelength nanostructuring and laser-annealing of thin indium-tin-oxide (ITO) films. The ablation experiments allowed for the generation of cuts of sub-100 nm width in periodic and single cut arrangements. Annealing resulted in a different phase of ITO which is more resistive against etching in HCl at room temperature. The dependence of cuts on scan parameters that affect the ITO film properties was investigated.

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Maziar Afshar, Somaie Saremi, Henning Völlm, Dara Feili, Helmut Seidel, Martin Straub, H. Zhang, and Karsten König "Multiphoton lithography and ITO structuring by high repetition-rate sub-15 femtosecond laser pulses", Proc. SPIE 7920, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVI, 792015 (25 February 2011); https://doi.org/10.1117/12.875897

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