An X-Ray Stepper For Production Lithography

E. Cullmann; K . A . Cooper; W. Vach

doi:10.1117/12.940346

30 June 1987 An X-Ray Stepper For Production Lithography

E. Cullmann, K . A . Cooper, W. Vach

Proceedings Volume 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI; (1987) https://doi.org/10.1117/12.940346
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

With design rules for integrated circuits attaining the_submicron range and current lithography techniques being pushed to their limits, the need for new lithography tools has become acute. A candidate for this is an X-ray stepper wilich provides high resolution with process latitude as well as high throughput. This paper will describe such a stepper.

Citation Download Citation

E. Cullmann, K . A . Cooper, and W. Vach "An X-Ray Stepper For Production Lithography", Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); https://doi.org/10.1117/12.940346

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available