CD-uniformity for 45nm NV memory on product-stack

Umberto Iessi; Brian Colombo; Johannes Plauth; Benedetta Triulzi; Elio De Chiara; Paolo Canestrari

doi:10.1117/12.846538

3 March 2010 CD-uniformity for 45nm NV memory on product-stack

Umberto Iessi, Brian Colombo, Johannes Plauth, Benedetta Triulzi, Elio De Chiara, Paolo Canestrari

Proceedings Volume 7640, Optical Microlithography XXIII; 76403I (2010) https://doi.org/10.1117/12.846538
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

CD uniformity budget for a 45-nm NV memory device requires the analysis and compensation of each single contributor factor. A dedicated simulation tool "CDU Predictor" helps to quantify the impact of main scanner and process factors for a comprehensive study of the CD Uniformity for an ideal flat wafer. However this analysis could under estimate the real CD distribution on a real production wafer if artefacts induced by thin-film effects and underling device topography significantly increase the contribution of the optical leveling-device to the total focus-error and hence spread the CD distribution for processes with low DOF. Such artefacts can be eliminated by application of an offset-map obtained by probing the mechanical top-surface of the resist-stack with an AirGauge (AirGaugeImprovedLEvelling, AGILE). The systematic variation of CD across the wafer, no matter whether due to fingerprints of the reticle, the device-topography, the track-process or the exposure-tool, can be mapped into dose-corrections for compensation (DoseMapper). We discuss an experimental case with a combination of both tools for an effective CD Uniformity optimization.

Citation Download Citation

Umberto Iessi, Brian Colombo, Johannes Plauth, Benedetta Triulzi, Elio De Chiara, and Paolo Canestrari "CD-uniformity for 45nm NV memory on product-stack", Proc. SPIE 7640, Optical Microlithography XXIII, 76403I (3 March 2010); https://doi.org/10.1117/12.846538

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available