Critical nanofabrication parameters for the e-beam assisted design of a subwavelength aluminum mesh

Clarisse Mazuir; Winston V. Schoenfeld

doi:10.1117/12.840546

16 February 2010 Critical nanofabrication parameters for the e-beam assisted design of a subwavelength aluminum mesh

Clarisse Mazuir, Winston V. Schoenfeld

Author Affiliations +

Proceedings Volume 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III; 759107 (2010) https://doi.org/10.1117/12.840546
Event: SPIE MOEMS-MEMS, 2010, San Francisco, California, United States

Abstract

Using finite difference time domain simulations and e-beam assisted lithography we designed and fabricated high transmission transparent contacts for UV nitride devices which consist in perpendicular sets of parallel aluminum lines with a period as low as 260 nm. Transmittance values as high as 100% were predicted for aluminum meshes with the optimized periods, metal line widths and thicknesses. Simulations were compared with optical transmittance measurements. The critical parameters -such as grain size, edge roughness and mesh coating- were determined. The large aluminum grain was decreased by performing a cold aluminum deposition. The aluminum oxide layer over the aluminum mesh was found to reduce the mesh transmittance. Several alternatives were studied to overcome this issue such as coating the mesh with a thin gold or silicon dioxide layer. While the second option appeared promising the addition of the gold layer required much more improvement.

Citation Download Citation

Clarisse Mazuir and Winston V. Schoenfeld "Critical nanofabrication parameters for the e-beam assisted design of a subwavelength aluminum mesh", Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 759107 (16 February 2010); https://doi.org/10.1117/12.840546

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