Higher order harmonics contribution and suppression in metrology beamline

Hongjun Zhou; Guanjun Wang; Jinjin Zheng; Tonglin Hou; Keqiang Qiu

doi:10.1117/12.885285

28 December 2010 Higher order harmonics contribution and suppression in metrology beamline

Hongjun Zhou, Guanjun Wang, Jinjin Zheng, Tonglin Hou, Keqiang Qiu

Proceedings Volume 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation; 754405 (2010) https://doi.org/10.1117/12.885285
Event: Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 2010, Hangzhou, China

Abstract

Using the house-made transmission grating (3300 l/mm) and IRDAXUV100G (USA) photodiode detector, higher order harmonics contributions have been measured in the spectral radiation standard and metrology beamline at NSRL and the contributions of the different orders have been analyzed. In order to accurately calibrate the performance of optical elements, higher order harmonics must be efficiently suppressed. Selecting the suitable filter in different wavelength, the higher order contributions can be efficiently suppressed. In wavelength region between 5 nm and 12 nm with proper Zr filters, the contributions of higher order intensity are less than 1.25%, after modified by quantum efficiency of the detector , the higher order contributions are restricted to less than 0.62 %. In wavelength region between 13 and 17 nm with Si filter, the higher order contributions are almost zero. In wavelength region between 18 nm and 34 nm with proper Al filter, the contributions of higher order intensity are less than 8.06%, after modified by quantum efficiency of the detector, the higher order contributions are restricted to less than 3.08 %.In wavelength region between 35 and 40nm with Al/Mg/Al filter, the higher order contributions are restricted to less than 10.00 % after modified by quantum efficiency of the detector.

Citation Download Citation

Hongjun Zhou, Guanjun Wang, Jinjin Zheng, Tonglin Hou, and Keqiang Qiu "Higher order harmonics contribution and suppression in metrology beamline", Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 754405 (28 December 2010); https://doi.org/10.1117/12.885285

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KEYWORDS

Sensors

Diffraction

Optical filters

Quantum efficiency

Aluminum

Metrology

Silicon

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