A novel method for overlay measurement by scatterometry

Wei-Te Hsu; Yi-Sha Ku; Deh-Ming Shyu

doi:10.1117/12.825091

10 September 2009 A novel method for overlay measurement by scatterometry

Wei-Te Hsu, Yi-Sha Ku, Deh-Ming Shyu

Proceedings Volume 7432, Optical Inspection and Metrology for Non-Optics Industries; 74320F (2009) https://doi.org/10.1117/12.825091
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

The potential of scatterometry has been developed for many years, but it is challenging to accurately and quickly obtain the overlay error from diffraction data. We presented a method to measure the overlay error by choosing an optimal measurement target design for scatterometry. All of the simulations in this study were calculated by rigorous coupled wave analysis. A set of two layer grating model were developed for evaluation of overlay measurement sensitivity at different incident angle, such as theta (0° to 90°) and phi (0° to 180°). We also compared the optical response of zero order and first order diffraction signature. We can use appropriate target design and measured condition to maximize the overlay measurement sensitivity and reduce the noise from lithography printing error. In addition, the diffractive signature imaging microscope (DSIM) is introduced to measure the diffraction signature. This instrument is a full-optical operation system without any mechanical movement, so it has good stabilization.

Citation Download Citation

Wei-Te Hsu, Yi-Sha Ku, and Deh-Ming Shyu "A novel method for overlay measurement by scatterometry", Proc. SPIE 7432, Optical Inspection and Metrology for Non-Optics Industries, 74320F (10 September 2009); https://doi.org/10.1117/12.825091

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