Modeling the work piece charging during e-beam lithography

Benjamin Alles; Eric Cotte; Bernd Simeon; Timo Wandel

doi:10.1117/12.776651

7 March 2008 Modeling the work piece charging during e-beam lithography

Benjamin Alles, Eric Cotte, Bernd Simeon, Timo Wandel

Proceedings Volume 6924, Optical Microlithography XXI; 69244P (2008) https://doi.org/10.1117/12.776651
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Nowadays, high end photomasks are usually patterned with electron beam writers since they provide a superior resolution. However, placement accuracy is severely limited by the so-called charging effect: Each shot with the electron beam deposits charges inside the mask blank which deflect the electrons in the subsequent shots and therefore cause placement errors. In this paper, a model is proposed which allows to establish a prediction of the deflection of the beam and thus provide a method for improving pattern placement for photomasks.

Citation Download Citation

Benjamin Alles, Eric Cotte, Bernd Simeon, and Timo Wandel "Modeling the work piece charging during e-beam lithography", Proc. SPIE 6924, Optical Microlithography XXI, 69244P (7 March 2008); https://doi.org/10.1117/12.776651

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