Optimization procedure of exposure tools with polarization aberrations

Tadashi Arai; Akihiro Yamada; Kenichiro Mori; Yoshinori Osaki; Toshiyuki Yoshihara; Yasuo Hasegawa

doi:10.1117/12.771962

1 April 2008 Optimization procedure of exposure tools with polarization aberrations

Tadashi Arai, Akihiro Yamada, Kenichiro Mori, Yoshinori Osaki, Toshiyuki Yoshihara, Yasuo Hasegawa

Proceedings Volume 6924, Optical Microlithography XXI; 69241I (2008) https://doi.org/10.1117/12.771962
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

In the Hyper-NA immersion age, it is essential to optimize all optical parameters, and so exposure tools must have functions to precisely control the parameters. There have been various reports indicating that polarization aberrations of projection optics affect imaging performance, but there have been few reports on reducing their influence in tools. We have developed a new method to optimize imaging performance with polarization taken into account. This paper describes a theoretical analysis of polarization with Pauli decomposition. A strict vectorial calculation of optical images matches our expression. Then, our solver software can determine the optimum conditions of all aberration parameters of exposure tools for specific IC patterns.

Citation Download Citation

Tadashi Arai, Akihiro Yamada, Kenichiro Mori, Yoshinori Osaki, Toshiyuki Yoshihara, and Yasuo Hasegawa "Optimization procedure of exposure tools with polarization aberrations", Proc. SPIE 6924, Optical Microlithography XXI, 69241I (1 April 2008); https://doi.org/10.1117/12.771962

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