Etch-less UV-NIL process for patterning photonic crystal structure onto OLED substrate

Jun-ho Jeong; Sohee Jeon; Jongyoup Shim; Jae Ryoun Youn; Hyung-Dol Park; Jae-Wook Kang; Jang-Joo Kim; Ki-don Kim; Dae-geun Choi; Junhyuk Choi; Dong-Il Lee; Ali Ozhan Altun; Soon-won Lee; Eung-sug Lee; Se-Heon Kim; Yong-Hee Lee

doi:10.1117/12.773301

20 March 2008 Etch-less UV-NIL process for patterning photonic crystal structure onto OLED substrate

Jun-ho Jeong, Sohee Jeon, Jongyoup Shim, Jae Ryoun Youn, Hyung-Dol Park, Jae-Wook Kang, Jang-Joo Kim, Ki-don Kim, Dae-geun Choi, Junhyuk Choi, Dong-Il Lee, Ali Ozhan Altun, Soon-won Lee, Eung-sug Lee, Se-Heon Kim, Yong-Hee Lee

Author Affiliations +

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69212D (2008) https://doi.org/10.1117/12.773301
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

An etch-less ultraviolet nanoimprint lithography (UV-NIL) process is proposed for patterning a photonic crystal (PC) structure onto an organic light-emitting diode (OLED) substrate. In a conventional UV-NIL, anisotropic etching is used to remove the residual layers and to transfer the patterns onto the substrate. The proposed process does not require an etching process. In the process, a stamp with nano-scale PC patterns is pressed on the dispensed resin and UV light is then exposed to cure the resin. After tens of seconds, the stamp is separated from the patterned polymer layer on the substrate. Finally, high-refractive index material is coated onto the layer. The refractive index of the polymer should be very similar to that of glass. The enhancement of the light extraction was assessed by the three-dimensional (3D) finite difference time domain (FDTD) method. The OLED was integrated on a nanoimprinted substrate and the electro-luminance intensity was found to have increased by as much as 50% compared to a conventional device.

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Jun-ho Jeong, Sohee Jeon, Jongyoup Shim, Jae Ryoun Youn, Hyung-Dol Park, Jae-Wook Kang, Jang-Joo Kim, Ki-don Kim, Dae-geun Choi, Junhyuk Choi, Dong-Il Lee, Ali Ozhan Altun, Soon-won Lee, Eung-sug Lee, Se-Heon Kim, and Yong-Hee Lee "Etch-less UV-NIL process for patterning photonic crystal structure onto OLED substrate", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212D (20 March 2008); https://doi.org/10.1117/12.773301

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