EUV mask inspection tool using high NA DUV inspection tool

Yongkyoo Choi; Sunghyun Oh; Munsik Kim; Yongdae Kim; Changreol Kim

doi:10.1117/12.773145

21 March 2008 EUV mask inspection tool using high NA DUV inspection tool

Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 692123 (2008) https://doi.org/10.1117/12.773145
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

A new inspection system with DUV laser beam and high NA optic for EUV mask has been developed to inspect defects on EUV blank mask and defects by process and handling. The development of new reflective image and optics has increased inspection speed on EUV mask before absorber etch and after absorber etch. Defect classification and operation has increased the productivity of inspection and particle control on EUV mask process. With this new inspection system, defects on blank mask, after resist develop and after etch processed mask were classified and evaluated to install EUV mask process. And defect sensitivities according to various pattern size and process steps were evaluated with required defect size of simulated printing effect on wafer. Designed defect pattern of 46nm node were prepared. Blank masks from Hoya were used. Patterns were exposed using 50KeV electron beam writer. After resist develop, patterns with program defect were inspected. After absorber etching, defects were inspected and evaluated. According to sub film, inspection condition was optimized. Using simulation tool, defects printability were simulated and compared with sensitivity of this inspection tool. Our results demonstrate that this inspection tool is very effective to detect and identify defects and their sources on EUV mask process. In this paper, mask inspection performance of high NA, DUV optic with short working distance was evaluated and described on programmed EUV mask.

Citation Download Citation

Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, and Changreol Kim "EUV mask inspection tool using high NA DUV inspection tool", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692123 (21 March 2008); https://doi.org/10.1117/12.773145

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available