Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser

P. W. Wachulak; D. Patel; M. G. Capeluto; C. S. Menoni; J. J. Rocca; M. C. Marconi

doi:10.1117/12.732900

11 October 2007 Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser

P. W. Wachulak, D. Patel, M. G. Capeluto, C. S. Menoni, J. J. Rocca, M. C. Marconi

Author Affiliations +

Proceedings Volume 6702, Soft X-Ray Lasers and Applications VII; 67020I (2007) https://doi.org/10.1117/12.732900
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm² with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up.

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P. W. Wachulak, D. Patel, M. G. Capeluto, C. S. Menoni, J. J. Rocca, and M. C. Marconi "Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser", Proc. SPIE 6702, Soft X-Ray Lasers and Applications VII, 67020I (11 October 2007); https://doi.org/10.1117/12.732900

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