Impact of thin film metrology on the lithographic performance of 193-nm bottom antireflective coatings

Chris A. Mack; Dale Harrison; Cristian Rivas; Phillip Walsh

doi:10.1117/12.711488

5 April 2007 Impact of thin film metrology on the lithographic performance of 193-nm bottom antireflective coatings

Chris A. Mack, Dale Harrison, Cristian Rivas, Phillip Walsh

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65181C (2007) https://doi.org/10.1117/12.711488
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

The performance needs of a bottom antireflection coating (BARC) used in advanced optical lithography are extremely demanding, with reflectivities as low as 0.1% and even lower often required. BARC thickness and complex refractive index values (n = n + iκ) must be highly optimized, requiring accurate knowledge of the BARC, resist and substrate optical properties. In this paper, we have performed a theoretical analysis of the BARC optimization process with respect to the propagation of BARC n and κ measurement errors. For several realistic cases, specifications on the measurement accuracy of these optical parameters will be derived and the lithographic consequences of BARC metrology errors will be explored. Approaches to improving the measurement of BARC thickness and refractive index will be suggested.

Citation Download Citation

Chris A. Mack, Dale Harrison, Cristian Rivas, and Phillip Walsh "Impact of thin film metrology on the lithographic performance of 193-nm bottom antireflective coatings", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65181C (5 April 2007); https://doi.org/10.1117/12.711488

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