First look at across-chip performance and process noise using non-contact performance-based metrology

Majid Babazadeh; Bertrand Borot; Wim Doedel; José Estabil; Jean Galvier; Gloria Johnson; Nader Pakdaman; Gary Steinbrueck; James Vickers

doi:10.1117/12.683362

15 March 2006 First look at across-chip performance and process noise using non-contact performance-based metrology

Majid Babazadeh, Bertrand Borot, Wim Doedel, José Estabil, Jean Galvier, Gloria Johnson, Nader Pakdaman, Gary Steinbrueck, James Vickers

Author Affiliations +

Proceedings Volume 6155, Data Analysis and Modeling for Process Control III; 615502 (2006) https://doi.org/10.1117/12.683362
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We report on the first non-contact, non-destructive performance measurements of embedded Ring Oscillators. Measurements are made on inside the die active area as early as Metal 1. A 90nm logic CMOS technology was used for this work. We have measured residual across-field performance process noise, and variation separate from and of opposite sense to wafer uniformity. This effect cannot be extrapolated from scribe measurements.

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Majid Babazadeh, Bertrand Borot, Wim Doedel, José Estabil, Jean Galvier, Gloria Johnson, Nader Pakdaman, Gary Steinbrueck, and James Vickers "First look at across-chip performance and process noise using non-contact performance-based metrology", Proc. SPIE 6155, Data Analysis and Modeling for Process Control III, 615502 (15 March 2006); https://doi.org/10.1117/12.683362

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