High power injection lock 6kHz 60W laser for ArF dry/wet lithography

Hakaru Mizoguchi; T. Inoue; J. Fujimoto; T. Suzuki; T. Matsunaga; S. Sakanishi; M. Kaminishi; Y. Watanabe; T. Nakaike; M. Shinbori; M. Yoshino; T. Kawasuji; H. Nogawa; H. Umeda; H. Taniguchi; Y. Sasaki; J. Kinoshita; T. Abe; H. Tanaka; H. Hayashi; K. Miyao; M. Niwano; A. Kurosu; M. Yashiro; H. Nagano; T. Igarashi; T. Mimura; K. Kakizaki

doi:10.1117/12.656972

21 March 2006 High power injection lock 6 kHz 60 W laser for ArF dry/wet lithography

Hakaru Mizoguchi, T. Inoue, J. Fujimoto, T. Suzuki, T. Matsunaga, S. Sakanishi, M. Kaminishi, Y. Watanabe, T. Nakaike, M. Shinbori, M. Yoshino, T. Kawasuji, H. Nogawa, H. Umeda, H. Taniguchi, Y. Sasaki, J. Kinoshita, T. Abe, H. Tanaka, H. Hayashi, K. Miyao, M. Niwano, A. Kurosu, M. Yashiro, H. Nagano, T. Igarashi, T. Mimura, K. Kakizaki

Author Affiliations +

Proceedings Volume 6154, Optical Microlithography XIX; 615425 (2006) https://doi.org/10.1117/12.656972
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

The 193-nm lithography is moving from the pre-production to the mass production phase and its target node is shifting from 90 nm to 65 nm. And the ArF-immersion (Wet) technology is spotlighted as the enabling technology for below 45nm node¹⁾²⁾. Since 1998 we have demonstrated 30W, 0.12pm, @157nm line narrowed light source for microlithography with "Injection lock technology". The injection lock technology has advanced performances compared with MOPA (Master Oscillator Power Amplifier) technology, in efficiency, stability and spectral property. Based on this injection lock technology, we have successfully developed high power injection lock laser platform "GigaTwin" for 193nm lithography system GT40A (45W, 4000Hz, 11.25mJ) on Q4 2004³⁾⁴⁾. We have found solution for higher repetition rate up to 6kHz operation on the same platform as GT40A which is our original innovation named GT60A (Figure 1). In this paper, we will introduce this new GT60A (6kHz 60W) laser.

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Hakaru Mizoguchi, T. Inoue, J. Fujimoto, T. Suzuki, T. Matsunaga, S. Sakanishi, M. Kaminishi, Y. Watanabe, T. Nakaike, M. Shinbori, M. Yoshino, T. Kawasuji, H. Nogawa, H. Umeda, H. Taniguchi, Y. Sasaki, J. Kinoshita, T. Abe, H. Tanaka, H. Hayashi, K. Miyao, M. Niwano, A. Kurosu, M. Yashiro, H. Nagano, T. Igarashi, T. Mimura, and K. Kakizaki "High power injection lock 6 kHz 60 W laser for ArF dry/wet lithography", Proc. SPIE 6154, Optical Microlithography XIX, 615425 (21 March 2006); https://doi.org/10.1117/12.656972

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