Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process

Luke T. H. Hsu; C.H. Ho; C. C. Lin; Vincent Hsu; Ellison Chen; Paul Yu; Kong Son

doi:10.1117/12.632108

4 November 2005 Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process

Luke T. H. Hsu, C.H. Ho, C. C. Lin, Vincent Hsu, Ellison Chen, Paul Yu, Kong Son

Author Affiliations +

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 599207 (2005) https://doi.org/10.1117/12.632108
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

The standard inspection flow typically consists of transmitted light pattern inspection (die-to-die or die-to-database) and STARlight^TM (Simultaneous Transmitted And Reflective Light) contamination inspection. The initial introduction of TeraScan (DUV) inspection system was limited to transmitted pattern inspection modes. Hence, complete inspections of critical mask layers required utilizing TeraScan for maximized pattern defect sensitivity and the previous generation TeraStar (UV) for STARlight^TM contamination inspection. Recently, the reflective light die-to-database (dbR) inspection mode was introduced on the DUV tool to compliment transmitted light die-to-database (dbT) inspection. The dbR inspection mode provides not only pattern inspection but also contamination inspection capabilities. The intent of this evaluation is to characterize the dbR inspection capability on pattern defects and contaminations. A series of standard programmed defect test plates will be used to evaluate pattern inspection capability and a PSL test plate will be used to determine the contamination performance. Inspection results will be compared to the current inspection process of record (dbT + STARlight^TM). Lastly, the learning will be used to develop and implement an optimal dbR inspection flow for selected critical layers of the 65-nm node to meet the inspection criteria and minimize the cycle time.

Citation Download Citation

Luke T. H. Hsu, C.H. Ho, C. C. Lin, Vincent Hsu, Ellison Chen, Paul Yu, and Kong Son "Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599207 (4 November 2005); https://doi.org/10.1117/12.632108

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KEYWORDS

Inspection

Contamination

Deep ultraviolet

Ultraviolet radiation

Reticles

Image resolution

Photomask technology

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