Design and fabrication of digital dual-frequency patterns for projected fringe profilometry

Wei-Hung Su; Yi-Ling Hsu; Cho-Yo Kuo; Hong-Ming Chen; Wei-Chen Su; Shizhuo Yin

doi:10.1117/12.569992

16 December 2004 Design and fabrication of digital dual-frequency patterns for projected fringe profilometry

Wei-Hung Su, Yi-Ling Hsu, Cho-Yo Kuo, Hong-Ming Chen, Wei-Chen Su, Shizhuo Yin

Proceedings Volume 5606, Two- and Three-Dimensional Vision Systems for Inspection, Control, and Metrology II; (2004) https://doi.org/10.1117/12.569992
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States

Abstract

One key problem of fringe projection techniques for 3D shape measurements is the limited phase unambiguity range when only one grating period is used. Dual-frequency patterns in which involves two grating periods can easily extend the unambiguity range. A method to fabricate accurate dual-frequency patterns is presented. The advantage of using digital dual-frequency patterns for projected fringe profilometry are (1) high geometrical accuracy (< 0.5μm); (2) high contrast ratio; (3) very low high order harmonic distortions; and (4) extended unambiguity range.

Citation Download Citation

Wei-Hung Su, Yi-Ling Hsu, Cho-Yo Kuo, Hong-Ming Chen, Wei-Chen Su, and Shizhuo Yin "Design and fabrication of digital dual-frequency patterns for projected fringe profilometry", Proc. SPIE 5606, Two- and Three-Dimensional Vision Systems for Inspection, Control, and Metrology II, (16 December 2004); https://doi.org/10.1117/12.569992

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KEYWORDS

Fringe analysis

Transmittance

Phase shifts

Charge-coupled devices

3D metrology

Optical design

Fabrication

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