Paper
21 October 2004 Pulsed laser deposition of chromium oxides thin films: chemical stabilizations by capping and doping
Carmen-Daniela Stanoi, Gabriel Socol, Carmen Ristoscu, Emanuel Axente, D. Caiteanu, Ion N. Mihailescu, Cristiana E.A. Grigorescu, Beatrice Bastide, Odile Monnereau, Laurence Tortet, T. Zhang
Author Affiliations +
Proceedings Volume 5581, ROMOPTO 2003: Seventh Conference on Optics; (2004) https://doi.org/10.1117/12.582915
Event: ROMOPTO 2003: Seventh Conference on Optics, 2003, Constanta, Romania
Abstract
The half-metallic ferromagnetic chromium dioxide (Tc = 390 K) is a prospective material for spintronics applications. We employed pulsed laser deposition (PLD) to grow thin films of various chromium oxides. The experiments have been carried out in oxygen at different dynamical pressures, using a KrF* laser source (λ = 248 nm, τFWHM ≥ 30 ns), various chromium oxide targets, such as CrO3, Cr8O21 (the latter ones both pure and doped with Y and Sb respectively, for stabilization purposes) and sapphire substrates (c-cut). We optimized the laser fluence. To avoid CrO2 reduction to Cr2O3 in very thin films when kept in atmospheric air, we applied a protection with gold. X-ray diffraction, electron microscopy and Raman spectroscopy evidence uniform films containing CrO2.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Carmen-Daniela Stanoi, Gabriel Socol, Carmen Ristoscu, Emanuel Axente, D. Caiteanu, Ion N. Mihailescu, Cristiana E.A. Grigorescu, Beatrice Bastide, Odile Monnereau, Laurence Tortet, and T. Zhang "Pulsed laser deposition of chromium oxides thin films: chemical stabilizations by capping and doping", Proc. SPIE 5581, ROMOPTO 2003: Seventh Conference on Optics, (21 October 2004); https://doi.org/10.1117/12.582915
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KEYWORDS
Chromium

Thin films

Oxides

Pulsed laser deposition

Gold

Scanning electron microscopy

Semiconductors

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