Paper
25 May 2004 The noise behavior of JFET transistors from room temperature down to 80 k
C. Arnaboldi, Giuliano Boella, E. Panzeri, Gianluigi Pessina
Author Affiliations +
Proceedings Volume 5470, Noise in Devices and Circuits II; (2004) https://doi.org/10.1117/12.555775
Event: Second International Symposium on Fluctuations and Noise, 2004, Maspalomas, Gran Canaria Island, Spain
Abstract
We have designed and built a very simple and efficient instrument that allows performing very accurate noise measurements of transistors at any biasing conditions, from room temperature down to cryogenic temperatures. This way a study has been possible of the noise behavior of Silicon JFETs for both the low frequency and the high frequency white noise. We explored a wide range of biasing conditions, starting from a power dissipation of only 2 μW up to 1 μW. Concerning white noise, evidence was found for the hot electron effect: it was negligible at small power dissipation and evident at large power. An experimental study was made of the low frequency noise. Its interpretation was developed based on the Generation Recombination theory. Many JFET samples were investigated, made with different technologies and having different gate area.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. Arnaboldi, Giuliano Boella, E. Panzeri, and Gianluigi Pessina "The noise behavior of JFET transistors from room temperature down to 80 k", Proc. SPIE 5470, Noise in Devices and Circuits II, (25 May 2004); https://doi.org/10.1117/12.555775
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KEYWORDS
Transistors

Field effect transistors

Temperature metrology

Silicon

Cryogenics

Aluminum

Linear filtering

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