Recent Advances Of Optical Step-And-Repeat System

N. Shiotake; S. Yoshida

doi:10.1117/12.947498

20 June 1985 Recent Advances Of Optical Step-And-Repeat System

N. Shiotake, S. Yoshida

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947498
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

The current model of an optical step and repeat system for use in production line has a projection lens with a resolution of l.0m and provides a machine-to-machine overlay accuracy of approximately ±0.2 pm (95% range). The accuracy is to be further improved with a newly developed field-by-field alignment system. The i-line projection lens, developed for higher resolution, adequately resolves 0.8um lines and spaces.

Citation Download Citation

N. Shiotake and S. Yoshida "Recent Advances Of Optical Step-And-Repeat System", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947498

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