Thermo-optically tunable thin film devices

Lawrence H. Domash

doi:10.1117/12.503620

20 October 2003 Thermo-optically tunable thin film devices

Lawrence H. Domash

Proceedings Volume 5225, Nano- and Micro-Optics for Information Systems; (2003) https://doi.org/10.1117/12.503620
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

We report advances in tunable thin film technology and demonstration of multi-cavity tunable filters. Thin film interference coatings are the most widely used optical technology for telecom filtering, but until recently no tunable versions have been known except for mechanically rotated filters. We describe a new approach to broadly tunable components based on the properties of semiconductor thin films with large thermo-optic coefficients. The technology is based on amorphous silicon deposited by plasma-enhanced chemical vapor deposition (PECVD), a process adapted for telecom applications from its origins in the flat-panel display and solar cell industries. Unlike MEMS devices, tunable thin films can be constructed in sophisticated multi-cavity, multi-layer optical designs.

Citation Download Citation

Lawrence H. Domash "Thermo-optically tunable thin film devices", Proc. SPIE 5225, Nano- and Micro-Optics for Information Systems, (20 October 2003); https://doi.org/10.1117/12.503620

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