Wave-optical considerations in photolithography

Alfred K. Wong; Christophe Pierrat

doi:10.1117/12.508622

31 December 2003 Wave-optical considerations in photolithography

Alfred K. Wong, Christophe Pierrat

Author Affiliations +

Proceedings Volume 5182, Wave-Optical Systems Engineering II; (2003) https://doi.org/10.1117/12.508622
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Wave-optical effects are becoming more pronounced as optical lithography is pushed towards its limit. Photomask topography scattering and wafer polarization effects caused by differences in coupling between transverse electric and transverse magnetic waves degrade image quality. But polarization may provide an extra dimension that allows lithographers to devise simple solutions to otherwise difficult problems such as phase assignment.

Citation Download Citation

Alfred K. Wong and Christophe Pierrat "Wave-optical considerations in photolithography", Proc. SPIE 5182, Wave-Optical Systems Engineering II, (31 December 2003); https://doi.org/10.1117/12.508622

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE