Prevention of organic contamination in lithographic systems

John J Scialdone; Glenn P Rosecrans

doi:10.1117/12.506079

22 January 2004 Prevention of organic contamination in lithographic systems

John J Scialdone, Glenn P Rosecrans

Proceedings Volume 5178, Optical Modeling and Performance Predictions; (2004) https://doi.org/10.1117/12.506079
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

The reduction in molecular outgassing afforded by the high vacuum degassing of the system components and the expected outgassing of the same when employed under normal ambient pressure and purging are evaluated and discussed. The contaminant deposits that could be expected from the residual outgassing systems are evaluated. A comparison of the contamination produced by the outgassed and non-outgassed systems has been carried out and is based on the outgassing rate of a combination of devices in the compartment obtained at the end of a reasonable period of outgassing in vacuum and on the rates at the time of employment.

Citation Download Citation

John J Scialdone and Glenn P Rosecrans "Prevention of organic contamination in lithographic systems", Proc. SPIE 5178, Optical Modeling and Performance Predictions, (22 January 2004); https://doi.org/10.1117/12.506079

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