Scanning probe microscopy of nanocrystalline iridium oxide thin films

Daniel Pailharey; D. Tonneau; A. Houel; A. Kuzmin; R. Kalendarev; J. Purans

doi:10.1117/12.517031

8 August 2003 Scanning probe microscopy of nanocrystalline iridium oxide thin films

Daniel Pailharey, D. Tonneau, A. Houel, A. Kuzmin, R. Kalendarev, J. Purans

Proceedings Volume 5123, Advanced Optical Devices, Technologies, and Medical Applications; (2003) https://doi.org/10.1117/12.517031
Event: 2003 Chapter books, 2003, Bellingham, WA, United States

Abstract

Structural investigations of nanocrystalline iridium oxide thin films, prepared by dc magnetron sputtering technique were performed by scanning probe microscopy (SPM). SPM studies, using both atomic force microscopy (AFM) and scanning tunnelling microscopy (STM), indicate that the thin films are composed of grains with a size of about 20-50 nm. Fine crystallinity and small RMS microroughness of the films, being well below 2 nm, make iridium oxide thin films promising candidates for nanolithographic applications. The possibility to perform nanolithograhpic processes at a scale of less than 150 nm was successfully examined in AFM and STM modes.

Citation Download Citation

Daniel Pailharey, D. Tonneau, A. Houel, A. Kuzmin, R. Kalendarev, and J. Purans "Scanning probe microscopy of nanocrystalline iridium oxide thin films", Proc. SPIE 5123, Advanced Optical Devices, Technologies, and Medical Applications, (8 August 2003); https://doi.org/10.1117/12.517031

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