Subfield scheduling for throughput maximization in electron-beam photomask fabrication

Sergey V. Babin; Andrew B. Kahng; Ion I. Mandoiu; Swamy Muddu

doi:10.1117/12.484981

16 June 2003 Subfield scheduling for throughput maximization in electron-beam photomask fabrication

Sergey V. Babin, Andrew B. Kahng, Ion I. Mandoiu, Swamy Muddu

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484981
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Resist heating is one of the largest contributors to critical dimension (CD) distortion in electron beam photomask fabrication. Previous methods for reducing CD variation caused by resist heating include lower beam currents, increased delays between electron flashes, and writing in multiple passes. However, all these methods lower mask writing throughput. This leads to increased mask writing cost, which is increasingly becoming a major limiting factor to semiconductor industry productivity. In this work, we investigate a new degree of freedom for mitigating CD distortion caused by resist heating. By optimizing the sequence in which subfields are being written, it is possible to reduce CD variability caused by resist heating, without significantly increasing the mask writing time.

Citation Download Citation

Sergey V. Babin, Andrew B. Kahng, Ion I. Mandoiu, and Swamy Muddu "Subfield scheduling for throughput maximization in electron-beam photomask fabrication", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484981

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