Effects of radiation-induced carbon contamination on the performance of an EUV lithographic optic

Anton Barty; Kenneth A. Goldberg

doi:10.1117/12.499372

16 June 2003 Effects of radiation-induced carbon contamination on the performance of an EUV lithographic optic

Anton Barty, Kenneth A. Goldberg

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.499372
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Carbon deposition in EUVL is known to occur when optical surfaces in a hydrocarbon environment are exposed to EUV light. Carbon contamination on EUV optical elements affects both the absorption and phase of the reflected light. Because the carbon deposition alters the phase structure of the reflected EUV light it effectively alters the figure of these optics and, thus, the aberrations as well. Absorption by deposited carbon not only reduces throughput but also leads to apodisation of the pupil, which in turn affects imaging performance.

Citation Download Citation

Anton Barty and Kenneth A. Goldberg "Effects of radiation-induced carbon contamination on the performance of an EUV lithographic optic", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.499372

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