Controlling CD variations in a massively parallel pattern generator

Jarek Z. Luberek; Allen M. Carroll; Torbjoern Sandstrom; Andrzej Karawajczyk

doi:10.1117/12.474615

30 July 2002 Controlling CD variations in a massively parallel pattern generator

Jarek Z. Luberek, Allen M. Carroll, Torbjoern Sandstrom, Andrzej Karawajczyk

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474615
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Micronic is developing a massively parallel pattern generation system based on a micro-mechanical spatial light modulator (SLM). The electro-mechanical and optical properties of the micromirrors in the SLM can vary from one to another and over time. Therefore the response of each mirror must be calibrated, with accuracy sufficient to maintain CD uniformity requirements. We present a practical method for performing this calibration which greatly improves the micromirror grayscale uniformity and reduces CD error contribution from the SLM to less than 2nm.

Citation Download Citation

Jarek Z. Luberek, Allen M. Carroll, Torbjoern Sandstrom, and Andrzej Karawajczyk "Controlling CD variations in a massively parallel pattern generator", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474615

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