Characterization and control of organic airborne contamination in lithographic processing

Andrew J. Dallas; Kristine M. Graham; Marc Clarysse; Vic Fonderle

doi:10.1117/12.473438

16 July 2002 Characterization and control of organic airborne contamination in lithographic processing

Andrew J. Dallas, Kristine M. Graham, Marc Clarysse, Vic Fonderle

Author Affiliations +

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473438
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

In the DUV lithographic process, airborne contamination, such as ammonia and 1-methyl-2-pyrrolidinone, is known to present several processing problems. Presently, these airborne contaminants are effectively controlled using either acid-base or ion-exchange chemistry. However, as lithographic processing moves towards the creation of smaller features using 193 nm and 157 nm technologies, airborne and condensable organic contamination presents an ever-increasing concern. In addition, the wide range of chemical and physical properties of the organic contaminants found in the processing environment, do not lend themselves to effective control using the specific chemisorptive techniques currently applied. In conjunction with our efforts to design improved chemical filters for the effective control of organic airborne contaminants, we have attempted to characterize the organic airborne contamination found in the lithographic processing environment. In addition, we have evaluated the effectiveness of activated carbon filters for their removal. In this report, we will present our current findings and reveal some of the benefits and concerns associated with the use of activated carbon-based chemical filters for the control of organic airborne contamination in present and future processing applications.

Citation Download Citation

Andrew J. Dallas, Kristine M. Graham, Marc Clarysse, and Vic Fonderle "Characterization and control of organic airborne contamination in lithographic processing", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473438

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE