Characterization of laser-induced EUV plasma sources

Sebastian Kranzusch; Klaus R. Mann

doi:10.1117/12.448456

14 November 2001 Characterization of laser-induced EUV plasma sources

Sebastian Kranzusch, Klaus R. Mann

Proceedings Volume 4504, Applications of X Rays Generated from Lasers and Other Bright Sources II; (2001) https://doi.org/10.1117/12.448456
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

A laser-based EUV plasma source is described, which is going to be utilized for characterization of EUV optical components and sensoric devices in the wavelength region from 11 to 13nm. EUV radiation is generated by focusing a Nd:YAG laser into a double stream gas puff target. By the use of different target gases, broadband as well as narrow-band EUV radiation can be obtained. The emission characteristics of the radiation is monitored by the help of different diagnostic tools including a pinhole camera, an EUV spectrometer, and various EUV photodiodes, either directly or after reflection from multilayer mirrors. Moreover, first wavefront measurements of EUV radiation are performed with the help of a specially designed wavefront analyzer based on the Hartmann-Shack principle, which was sensibilized for 13nm radiation. This device can be used as an alternative to interferometric measurements for an assessment of the optical quality of EUV optics, e.g. for at wavelength monitoring of aberrations (including Zernike analysis), as well as for on-line monitoring of heating effects.

Citation Download Citation

Sebastian Kranzusch and Klaus R. Mann "Characterization of laser-induced EUV plasma sources", Proc. SPIE 4504, Applications of X Rays Generated from Lasers and Other Bright Sources II, (14 November 2001); https://doi.org/10.1117/12.448456

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