Reliable materials and instruments for 157-nm lithography

Klaus Vogler; Frank Voss; Elko Bergmann; Uwe Stamm; Wojciech J. Walecki; Dirk Basting

doi:10.1117/12.425041

12 April 2001 Reliable materials and instruments for 157-nm lithography

Klaus Vogler, Frank Voss, Elko Bergmann, Uwe Stamm, Wojciech J. Walecki, Dirk Basting

Author Affiliations +

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425041
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

While the 157 nm optical lithography has become recognized as the most promising solution for the 70-nm node of Semiconductor Industry Association Roadmap, the reliable metrology for this spectral range still remains one of the biggest challenges. We report the results of our long-term exposure measurements, which led to improved performance of the optical components of F₂ laser. We discuss in detail the development of the reliable energy monitors degrading less than 3% per billion pulses. We also report the development of novel VUV laser beam profiling tool, measuring the divergence and the width of the beam with accuracy of 0.05 mrad, and 0.10 mm respectively. The compact size makes this tool useful for applications outside the optical laboratory. We also discuss present status and our recent contributions to the high resolution VUV spectroscopy and demanding requirements imposed by 157 nm lithography.

Citation Download Citation

Klaus Vogler, Frank Voss, Elko Bergmann, Uwe Stamm, Wojciech J. Walecki, and Dirk Basting "Reliable materials and instruments for 157-nm lithography", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425041

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