Advanced VUV spectrometer for F2 laser metrology

Eckehard D. Onkels; German Rylov; Richard L. Sandstrom

doi:10.1117/12.435645

14 September 2001 Advanced VUV spectrometer for F₂ laser metrology

Eckehard D. Onkels, German Rylov, Richard L. Sandstrom

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435645
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

The advent of 157 nm F₂ lasers in lithographic application implied new challenges in spectral metrology. The approaches for the lithographic imaging system, that have been suggested so far, differ in the requirements of the spectral bandwidth of the laser. However, even designs with less stringent demands will require high-resolution spectral metrology in order to enable comprehensible spectral bandwidth and purity measurements or specifications. Ideally, narrowband calibration sources in the VUV range should be used to precisely determine the instrument function of the spectrometer, enabling correct spectral de-convolution. However, most schemes for generation of appropriate light sources are rather complex and thus expensive. Stability and lifetime of solid state sources, i.e. nonlinear optical devices, are expected to be not satisfying too. The principal approach for a spectrometer design should be to increase the inherent spectral resolution of the instrument above the required specification limits of the laser systems under investigation, avoiding or at least significantly reducing the necessity of spectral de-convolution. Following this path, the optical layout of an existing Echelle grating based spectrometer has been investigated and re-designed. Collimation and imaging quality of the spectrometer could be considerably improved with the implementation of an aspheric focusing mirror.

Citation Download Citation

Eckehard D. Onkels, German Rylov, and Richard L. Sandstrom "Advanced VUV spectrometer for F₂ laser metrology", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435645

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available