Improvement in E2 nozzle performance: no imprint and less contamination

KianSiong Ang; Shu Jin Low; AikChin Lim; CheeKeong Lim; LiahKee Loh; Yew-Kong Tan; Xu Xiang Yang

doi:10.1117/12.436753

22 August 2001 Improvement in E2 nozzle performance: no imprint and less contamination

KianSiong Ang, Shu Jin Low, AikChin Lim, CheeKeong Lim, LiahKee Loh, Yew-Kong Tan, Xu Xiang Yang

Proceedings Volume 4344, Metrology, Inspection, and Process Control for Microlithography XV; (2001) https://doi.org/10.1117/12.436753
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

This paper demonstrates the use of lifted E2 nozzle with modified developer recipe in TEL MARK 8 track to reduce killer defects such as E2 nozzle imprints and contamination such as resist residues and developer strain. This concept has helped to improve machine uptime due to less occurrence of E2 nozzle related defects shutdown.

Citation Download Citation

KianSiong Ang, Shu Jin Low, AikChin Lim, CheeKeong Lim, LiahKee Loh, Yew-Kong Tan, and Xu Xiang Yang "Improvement in E2 nozzle performance: no imprint and less contamination", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436753

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