Pulsed laser deposition of lithium niobate thin films

L. Canale; C. Girault-Di Bin; F. Cosset; A. Bessaudou; A. Celerier; J.-Louis Decossas; J.-C. Vareille

doi:10.1117/12.406370

15 December 2000 Pulsed laser deposition of lithium niobate thin films

L. Canale, C. Girault-Di Bin, F. Cosset, A. Bessaudou, A. Celerier, J.-Louis Decossas, J.-C. Vareille

Proceedings Volume 4087, Applications of Photonic Technology 4; (2000) https://doi.org/10.1117/12.406370
Event: 2000 International Conference on Application of Photonic Technology (ICAPT 2000), 2000, Quebec City, Canada

Abstract

Pulsed laser deposition of Lithium Niobate thin films onto sapphire (0001) substrates is reported. Thin films composition and structure have been determined using Rutherford Backscattermg Spectroscopy (RBS) and X-ray diffraction ( XRD) experiments. The influe:nce of deposition parameters such as substrate temperature, oxygen pressure and target to substrate distance on the composition and the structure of the films has been studied. Deposition temperature is found to be an important parameter which enables us to grow LiNbO3 films without the Li deficient phase LiNb3O8. Nearly stoichiometric thin fihns have been obtained for an oxygen pressure of 0. 1 Ton and a substrate temperature of 800°C. Under optimized conditions the (001) preferential orientation of growth, suitable for most optical applications, has been obtained.

Citation Download Citation

L. Canale, C. Girault-Di Bin, F. Cosset, A. Bessaudou, A. Celerier, J.-Louis Decossas, and J.-C. Vareille "Pulsed laser deposition of lithium niobate thin films", Proc. SPIE 4087, Applications of Photonic Technology 4, (15 December 2000); https://doi.org/10.1117/12.406370

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