Effect of heat treatment condition for protecting film on discharge characteristics of ac PDP

Hongxia Ren; Yue Hao

doi:10.1117/12.408292

29 November 2000 Effect of heat treatment condition for protecting film on discharge characteristics of ac PDP

Hongxia Ren, Yue Hao

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408292
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

With MgO film as an example, the effect of different heat treatment conditions in preparation of protecting film overcoating the dielectric layer in AC PDP (Plasma Display Panel) prepared by electron-beam evaporation method on the performance of AC PDP are thoroughly studied and discussed. The studied baking condition mainly focuses on treating atmosphere, air, vacuum, and inert gases atmosphere are considered. And also this observed dependence of the discharge characteristics on heat treatment condition of panel fabrication process is explained in terms of a postulated effect of oxygen on the surface properties of MgO films and the changes in the surface properties of MgO films produced by ion bombardment during discharge.

Citation Download Citation

Hongxia Ren and Yue Hao "Effect of heat treatment condition for protecting film on discharge characteristics of ac PDP", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408292

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