Paper
5 July 2000 Structure end foreshortening: lithography-driven design limitations
Uwe Paul Schroeder, Dennis J. Warner
Author Affiliations +
Abstract
Especially in logic lithography, the issue of end foreshortening becomes more and more relevant with increasingly small dimension of the printed patterns. This study examines the effect of illumination condition, mask type, and various feature types on space end foreshortening at 150nm ground rules. special emphasis is put on end foreshortening induced design limitations, which may prevent linear shrinks. Data from aerial image simulations, and from experimental data on specially designed test masks suggest that especially the variation of the end foreshortening as a function of defocus has to be considered. The most critical geometry is that of nested and butting space ends at minimum ground rules, where the foreshortening cannot be compensated completely by OPC.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Uwe Paul Schroeder and Dennis J. Warner "Structure end foreshortening: lithography-driven design limitations", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388930
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Photomasks

Lithography

Logic

Optical proximity correction

Manufacturing

Metals

Etching

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