193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers

Ratnam Sooriyakumaran; Debra Fenzel-Alexander; Phillip J. Brock; Carl E. Larson; Richard A. Di Pietro; Gregory M. Wallraff; Donald C. Hofer; Dan J. Dawson; Arpan P. Mahorowala; Marie Angelopoulos

doi:10.1117/12.388282

23 June 2000 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers

Ratnam Sooriyakumaran, Debra Fenzel-Alexander, Phillip J. Brock, Carl E. Larson, Richard A. Di Pietro, Gregory M. Wallraff, Donald C. Hofer, Dan J. Dawson, Arpan P. Mahorowala, Marie Angelopoulos

Author Affiliations +

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388282
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

We have designed and developed a high resolution 193 nm bilayer resist system based on alternating copolymers of silane substituted norbornene and maleic anhydride. We have utilized a combination of acid labile silane functionalities and acid stable silicon groups in this resist development.

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Ratnam Sooriyakumaran, Debra Fenzel-Alexander, Phillip J. Brock, Carl E. Larson, Richard A. Di Pietro, Gregory M. Wallraff, Donald C. Hofer, Dan J. Dawson, Arpan P. Mahorowala, and Marie Angelopoulos "193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388282

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