Innovative integrated plasma tool for process and exhaust monitoring

Eric Chevalier; Philippe Maquin

doi:10.1117/12.361362

27 August 1999 Innovative integrated plasma tool for process and exhaust monitoring

Eric Chevalier, Philippe Maquin

Proceedings Volume 3884, In-Line Methods and Monitors for Process and Yield Improvement; (1999) https://doi.org/10.1117/12.361362
Event: Microelectronic Manufacturing '99, 1999, Santa Clara, CA, United States

Abstract

Vacuum-level problems in semiconductor process tools -- from leaks or contamination -- can significantly reduce product yield and tool availability if not detected quickly. Here we present a portable and compact plasma sensor which can monitor the fingerprint of effluent from the process chamber to the exhaust piping by optical emission spectroscopy. The device and tests to monitor and control semiconductor process are described. Further applications such as effluent treatment are tackled.

Citation Download Citation

Eric Chevalier and Philippe Maquin "Innovative integrated plasma tool for process and exhaust monitoring", Proc. SPIE 3884, In-Line Methods and Monitors for Process and Yield Improvement, (27 August 1999); https://doi.org/10.1117/12.361362

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