Submicron structure image formation by one-pulse intracavity laser processing

Vasily V. Valyavko; Vladimir P. Osipov

doi:10.1117/12.346890

28 April 1999 Submicron structure image formation by one-pulse intracavity laser processing

Vasily V. Valyavko, Vladimir P. Osipov

Proceedings Volume 3741, Lithography for Semiconductor Manufacturing; (1999) https://doi.org/10.1117/12.346890
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom

Abstract

There are shown the basic experimental result, achieved by the 1.06-micrometer intracavity laser processing of the 800 angstrom aluminum film evaporated on the optical glass substrate. There is described the nw laser cavity geometry, which allows to form 2D submicron-size image on the solid- state surface by means of one pulse of laser radiation.

Citation Download Citation

Vasily V. Valyavko and Vladimir P. Osipov "Submicron structure image formation by one-pulse intracavity laser processing", Proc. SPIE 3741, Lithography for Semiconductor Manufacturing, (28 April 1999); https://doi.org/10.1117/12.346890

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