Effect of developer normality on the resist dissolution rate and performance

Medhat A. Toukhy; Brian Maxwell; Somboun Chanthalyma

doi:10.1117/12.350259

11 June 1999 Effect of developer normality on the resist dissolution rate and performance

Medhat A. Toukhy, Brian Maxwell, Somboun Chanthalyma

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350259
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Process simulation is necessary to investigate possible enhancements of some selective resist performance properties as a result of changes in the developer concentration. Accurate dissolution parameters are needed for different developer normalities to simulate their effect on the resist dissolution rates. Only qualitative similarities are observed in the dissolution behavior of similar chemistry based resist as a function of developer normalities. Quantitative differences in the dissolution rates and curve shapes are detected between resist based on different chemistries. No single universal dissolution model capable of describing the behavior of all different resists was found. However, individual resist dissolution/developer concentration models can be constructed.

Citation Download Citation

Medhat A. Toukhy, Brian Maxwell, and Somboun Chanthalyma "Effect of developer normality on the resist dissolution rate and performance", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350259

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