Paper
19 March 1999 1850 A/W responsivity in optically controlled MOSFET by illumination of 1.5 μm wavelength light
Yuichi Nitta, Tomonari Yamagata, Yohei Takano, Kazuhiko Shimomura
Author Affiliations +
Abstract
The gate length dependencies of the optical response characteristics in the optically controlled MOSFET have measured. This device was the integrated structure of absorption region and MOSFET region by using direct wafer bonding technique. By reducing the gate length of MOSFET region, the transconductance of FET channel was increased, and we obtained high current modulation and responsivity by irradiation of 1.5 micrometer wavelength light.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuichi Nitta, Tomonari Yamagata, Yohei Takano, and Kazuhiko Shimomura "1850 A/W responsivity in optically controlled MOSFET by illumination of 1.5 μm wavelength light", Proc. SPIE 3630, Silicon-based Optoelectronics, (19 March 1999); https://doi.org/10.1117/12.342793
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KEYWORDS
Field effect transistors

Absorption

Modulation

Wafer-level optics

Semiconducting wafers

Wafer bonding

Channel projecting optics

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