Novel method for fabricating waveguide grating by phase mask technique

Shaojie Ma; Yan Li; Mai Xu; Yushan Yi; Jiuling Lin

doi:10.1117/12.317967

12 August 1998 Novel method for fabricating waveguide grating by phase mask technique

Shaojie Ma, Yan Li, Mai Xu, Yushan Yi, Jiuling Lin

Proceedings Volume 3551, Integrated Optoelectronics II; (1998) https://doi.org/10.1117/12.317967
Event: Photonics China '98, 1998, Beijing, China

Abstract

We report the fabrication of waveguides gratings coupler in photoresist by using a volume holographic gratings and that of the holographic gratings by Red Sensitive Photopolymer at 632.8 nm. The holographic gratings can produce diffracted light of 0 and -1 orders with equal intensity. The two diffracted light beams yield the interference fringe of period in near field, which is as laser sources to expose the photoresist on waveguide.

Citation Download Citation

Shaojie Ma, Yan Li, Mai Xu, Yushan Yi, and Jiuling Lin "Novel method for fabricating waveguide grating by phase mask technique", Proc. SPIE 3551, Integrated Optoelectronics II, (12 August 1998); https://doi.org/10.1117/12.317967

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