Properties of polycrystalline diamond as x-ray mask

Jeng Tzong Sheu; G. Y. Yang; B. R. Huang

doi:10.1117/12.324054

1 September 1998 Properties of polycrystalline diamond as x-ray mask

Jeng Tzong Sheu, G. Y. Yang, B. R. Huang

Proceedings Volume 3512, Materials and Device Characterization in Micromachining; (1998) https://doi.org/10.1117/12.324054
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States

Abstract

1.5 micrometer thick polycrystalline diamond film was deposited using microwave plasma chemical vapor deposition (MPCVD) as x-ray mask membrane with 0.1 approximately 0.25 micrometer seeding. The temperature is controlled between 820 to 830 degree Celsius and the ratios of CH₄/H₂ gas mixtures are varied for the quality and stress of the diamond film. The optical properties and radiation damage of the membrane will be demonstrated. Low tensile stress diamond membrane has been formed with backside KOH etching. Surface morphology was monitored by the AFM and the quality of the diamond film was measured by the Raman spectroscopy.

Citation Download Citation

Jeng Tzong Sheu, G. Y. Yang, and B. R. Huang "Properties of polycrystalline diamond as x-ray mask", Proc. SPIE 3512, Materials and Device Characterization in Micromachining, (1 September 1998); https://doi.org/10.1117/12.324054

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