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27 August 1998 Scanning auger microscopy studies of microelectronic features
Sandro Santucci, Luca Lozzi, Davide Pacifico, P. Picozzi, Roberto Alfonsetti, Giuseppe Moccia
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Proceedings Volume 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II; (1998) https://doi.org/10.1117/12.324419
Event: Microelectronic Manufacturing, 1998, Santa Clara, CA, United States
Abstract
Scanning Auger Microscopy has been applied to study two typical problems in microelectronic features: depth profile analysis and defects. We have performed Auger depth profiles with and without the sample rotation during the sputtering and we have compared the results in terms of interface width and uniformity of the sputtered surface. Atomic Force Microscopy has been used to characterize the surface morphology and its results have been correlated to Auger map data. Microelectronics structures with a sizes of about 400 nm have been studied by means of Auger high resolution maps before and after electrical tests, in order to determine the effects of the tests on their structure.
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Sandro Santucci, Luca Lozzi, Davide Pacifico, P. Picozzi, Roberto Alfonsetti, and Giuseppe Moccia "Scanning auger microscopy studies of microelectronic features", Proc. SPIE 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II, (27 August 1998); https://doi.org/10.1117/12.324419
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KEYWORDS
Microelectronics
Microscopy
Atomic force microscopy
Interfaces
Sputter deposition
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