Improving the radiometric performance of silicon-micromachined thermal infrared sources

R. Barry Johnson

doi:10.1117/12.328076

26 October 1998 Improving the radiometric performance of silicon-micromachined thermal infrared sources

R. Barry Johnson

Proceedings Volume 3436, Infrared Technology and Applications XXIV; (1998) https://doi.org/10.1117/12.328076
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

The emitting area of the infrared sources comprising silicon micromachined thermal pixel arrays is often notably smaller than the actual pixel area. This results in the infrared sources being operated at higher temperatures than apparent temperatures which therefore limits radiometric dynamic range. An optomechanical means has been developed that transforms the low-fill factor devices into having a much higher fill factor. The theory, fabrication, and initial tests results are presented.

Citation Download Citation

R. Barry Johnson "Improving the radiometric performance of silicon-micromachined thermal infrared sources", Proc. SPIE 3436, Infrared Technology and Applications XXIV, (26 October 1998); https://doi.org/10.1117/12.328076

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